، صفحه 0-0 (1)

عنوان دوره: اولین دوره بین المللی و بیست و هشتمین دوره ملی (1400)

In materials science, one of the most effective ways to improve the properties of base metal is to coat it with another material. The aim of this study is to carbon deposition on tungsten samples using a 4.5 kJ plasma focus device to improve the properties of tungsten. In such a manner, The films were characterized using atomic force microscopy, and Raman spectrometry with different numbers of focus shots. Results showed that the quality of deposited tungsten from AFM images and Raman spectrometry increased when the number of shots increased from 10 to 20 and then to 30. The AFM results show the formed structure tends towards a regular honeycomb structure in which each carbon atom is bonded to three other carbon atoms. In addition, the average and root mean square (rms) values of the measurements are raised when the number of shots increases from 10 to 20 then 30.

Plasma focus device؛ Atomic force microscopy؛ Raman؛ AFM